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dc.contributor.authorWarcholinski, B
dc.contributor.authorGilewicz, A
dc.contributor.authorMyslinski, P
dc.contributor.authorDobruchowska, E
dc.contributor.authorMurzynski, D
dc.contributor.authorKochmanski, P
dc.contributor.authorRokosz, Krzysztof
dc.contributor.authorRaaen, Steinar
dc.date.accessioned2021-03-31T10:06:40Z
dc.date.available2021-03-31T10:06:40Z
dc.date.created2020-10-28T12:17:14Z
dc.date.issued2021
dc.identifier.citationTribology International. 2021, 154 .en_US
dc.identifier.issn0301-679X
dc.identifier.urihttps://hdl.handle.net/11250/2736207
dc.description.abstractCathodic arc evaporation deposition method was applied to forming Al–Cr–B–N coatings. The effect of nitrogen pressure (pN2) and substrate bias voltage (UB) on the properties of the coatings synthesized using Al50Cr30Br20 cathode was investigated. The chemical and phase composition of the coatings, their surface morphology together with the mechanical, tribological and anti-corrosion properties were investigated. X-ray diffraction investigations have revealed the coatings phase composition. It is the mixture of h-AlN and c-CrN phases with crystallite size of about 4 nm. X-ray photoelectron spectroscopy has revealed amorphous BN phase in the investigated coatings. The majority of the coatings exhibit good adhesion, with the critical load above 75 N, except from the coating synthesized at the nitrogen pressure of 2 Pa. Coatings synthesized under various nitrogen pressure have a similar coefficient of friction of about 0.67. The wear resistance for these coatings increases with the nitrogen pressure during their synthesis. Friction coefficient of the coatings increases with substrate bias voltage, while the wear rate decreases. Wear and corrosion tests show that the coating deposited under pN2 = 4 Pa and UB = −100 V is the most resistant to wear and corrosion from the sets of coatings tested.en_US
dc.language.isoengen_US
dc.publisherElsevieren_US
dc.titleEffect of nitrogen pressure and substrate bias voltage on the properties of Al–Cr–B–N coatings deposited using cathodic arc evaporationen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.source.pagenumber11en_US
dc.source.volume154en_US
dc.source.journalTribology Internationalen_US
dc.identifier.doi10.1016/j.triboint.2020.106744
dc.identifier.cristin1842914
dc.description.localcodeThis article will not be available due to copyright restrictions (c) 2020 by Elsevieren_US
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode2


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