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dc.contributor.authorBang, Ambjørn Dahle
dc.contributor.authorHallsteinsen, Ingrid
dc.contributor.authorChopdekar, Rajesh V.
dc.contributor.authorOlsen, Fredrik Kjemperud
dc.contributor.authorSlöetjes, Samuel Dingeman
dc.contributor.authorKjærnes, Kristoffer
dc.contributor.authorArenholz, Elke
dc.contributor.authorFolven, Erik
dc.contributor.authorGrepstad, Jostein
dc.date.accessioned2020-02-05T08:52:51Z
dc.date.available2020-02-05T08:52:51Z
dc.date.created2019-11-25T13:52:39Z
dc.date.issued2019
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/11250/2639701
dc.description.abstractIn this study, we report on a shape-imposed magnetic anisotropy in micro- and nanostructures defined in antiferromagnetic (AF) LaFeO3 (LFO) thin films. Two distinct types of structures are investigated: embedded magnets created via ion implantation and free-standing magnets created via ion milling. Using a combination of x-ray photoemission electron microscopy and x-ray absorption spectroscopy, we examine the impact of the structure type, AF layer thickness, and crystal geometry on the Néel vector orientation in these structures. We demonstrate a distinct shape-imposed anisotropy in embedded and free-standing structures alike and show that both parallel and perpendicular alignments of the AF spin axis with respect to structure edges can be achieved by variation of the AF layer thickness and the orientation of the structure edges with respect to the LFO crystalline axes. This work demonstrates how the fabrication procedure affects the magnetic order in thin film AF nanostructures and shows how nanoscale patterning can be used to control the orientation of the Néel vector in epitaxial oxide thin films.nb_NO
dc.language.isoengnb_NO
dc.publisherAIP Publishingnb_NO
dc.titleShape-imposed anisotropy in antiferromagnetic complex oxide nanostructuresnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.volume115nb_NO
dc.source.journalApplied Physics Lettersnb_NO
dc.source.issue11nb_NO
dc.identifier.doi10.1063/1.5116806
dc.identifier.cristin1751913
dc.description.localcodeThis is the authors’ accepted and refereed manuscript to the article. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.5116806nb_NO
cristin.unitcode194,63,35,0
cristin.unitnameInstitutt for elektroniske systemer
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode2


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