1.9 micron Tm3+-doped germanate fiber laser source for Si-processing

dc.contributor.author	Dvoyrin, Vladislav
dc.contributor.author	Sorokina, Irina T
dc.contributor.author	Okhotnikov, Oleg
dc.contributor.author	Mashinsky, Valery M.
dc.contributor.author	Ischakova, Lyudmila D.
dc.contributor.author	Dianov, Evgenii M
dc.contributor.author	Khopin, Vladimir F.
dc.contributor.author	Guryanov, Aleksey N.
dc.date.accessioned	2018-05-07T10:53:48Z
dc.date.available	2018-05-07T10:53:48Z
dc.date.created	2012-01-20T02:38:27Z
dc.date.issued	2011
dc.identifier.isbn	978-1-55752-904-6
dc.identifier.uri	http://hdl.handle.net/11250/2497326
dc.description.abstract	We report development of a novel Tm3+ -doped fiber laser source at 1.86 μm based on highly nonlinear 55GeO2-45SiO2 dispersion shifted fiber, applicable to 3D-volume microprocessing of Si.	nb_NO
dc.language.iso	eng	nb_NO
dc.publisher	OSA Publishing	nb_NO
dc.relation.ispartof	Advanced Solid-State Photonics (ASSP)
dc.title	1.9 micron Tm3+-doped germanate fiber laser source for Si-processing	nb_NO
dc.type	Chapter	nb_NO
dc.description.version	publishedVersion	nb_NO
dc.identifier.doi	10.1364/FILAS.2011.FThE8
dc.identifier.cristin	891008
dc.description.localcode	This chapter will not be available due to copyright restrictions (c) 2011 by OSA Publishing	nb_NO
cristin.unitcode	194,66,20,0
cristin.unitname	Institutt for fysikk
cristin.ispublished	true
cristin.fulltext	preprint