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dc.contributor.authorSemenov, Ivan
dc.contributor.authorGunheim, Ingrid Folkestad
dc.contributor.authorNiayesh, Kaveh
dc.contributor.authorMeyer, Hans Kristian Hygen
dc.contributor.authorLundgaard, Lars Esben
dc.date.accessioned2023-03-14T08:53:38Z
dc.date.available2023-03-14T08:53:38Z
dc.date.created2022-04-19T14:03:33Z
dc.date.issued2022
dc.identifier.citationIEEE transactions on dielectrics and electrical insulation. 2022, 29 (2), 745-752.en_US
dc.identifier.issn1070-9878
dc.identifier.urihttps://hdl.handle.net/11250/3058082
dc.description.abstractThe objective of this paper is to characterize partial discharge (PD) inception voltages and patterns at sinusoidal and square voltages in insulating ceramic substrates with generic manufacturing defects. PD tests were conducted on active metal brazed (AMB) aluminum nitride (AlN) substrates either with cavities in the polymer coating or sharp protrusions of the metal brazing. The substrates were tested in silicone liquid instead of silicone gel. Light sensitive imaging was used to localize the PD sites on the surface. PDs at square voltage with rise time of 1,6 μs were measured with a high-frequency current transformer and a photomultiplier. In both substrate types, the peak-peak value of the PD inception voltage (PDIV) was higher at sinusoidal voltage compared to peak-peak value of the square wave. This difference was more pronounced in uncoated substrates where discharges incepted at sharp edges surrounded by silicone liquid. For both types of defects, comparable PDIVs were measured at bipolar and unipolar square waves. Results for unipolar pulses are discussed considering the role of charge memory effect.en_US
dc.description.abstractInvestigation of Partial Discharges in AlN Substrates under Fast Transient Voltagesen_US
dc.language.isoengen_US
dc.publisherIEEE, Institute of Electrical and Electronics Engineersen_US
dc.titleInvestigation of Partial Discharges in AlN Substrates under Fast Transient Voltagesen_US
dc.title.alternativeInvestigation of Partial Discharges in AlN Substrates under Fast Transient Voltagesen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionsubmittedVersionen_US
dc.rights.holder© IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.en_US
dc.source.pagenumber745-752en_US
dc.source.volume29en_US
dc.source.journalIEEE transactions on dielectrics and electrical insulationen_US
dc.source.issue2en_US
dc.identifier.doi10.1109/TDEI.2022.3163812
dc.identifier.cristin2017593
dc.relation.projectNorges forskningsråd: 294508en_US
dc.relation.projectNorges forskningsråd: 270033en_US
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode1


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