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dc.contributor.authorRoede, Erik Dobloug
dc.contributor.authorMosberg, Aleksander Buseth
dc.contributor.authorEvans, Donald
dc.contributor.authorBourret, Edith
dc.contributor.authorYan, Zewu
dc.contributor.authorVan Helvoort, Antonius
dc.contributor.authorMeier, Dennis
dc.date.accessioned2021-03-03T10:04:49Z
dc.date.available2021-03-03T10:04:49Z
dc.date.created2021-02-03T16:52:38Z
dc.date.issued2021
dc.identifier.citationAPL Materials. 2021, 9, .en_US
dc.identifier.issn2166-532X
dc.identifier.urihttps://hdl.handle.net/11250/2731338
dc.description.abstractFocused ion beam (FIB) and scanning electron microscopy (SEM) are used to reversibly switch improper ferroelectric domains in the hexagonal manganite ErMnO3. Surface charging is achieved by local ion (positive charging) and electron (positive and negative charging) irradiation, which allows controlled polarization switching without the need for electrical contacts. Polarization cycling reveals that the domain walls tend to return to the equilibrium configuration obtained in the as-grown state. The response of sub-surface domains is studied by FIB cross-sectioning, enabling imaging in the direction perpendicular to the applied electric field. The results clarify how the polarization reversal in hexagonal manganites progresses at the level of domains, resolving both domain wall movements and the nucleation and growth of new domains. Our FIB-SEM based switching approach is applicable to all ferroelectrics where a sufficiently large electric field can be built up via surface charging, facilitating contact-free high-resolution studies of the domain and domain wall response to electric fields in 3D.en_US
dc.language.isoengen_US
dc.publisherAIP Publishing, American Institute of Physicsen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleContact-free reversible switching of improper ferroelectric domains by electron and ion irradiationen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.source.volume9en_US
dc.source.journalAPL Materialsen_US
dc.identifier.doi10.1063/5.0038909
dc.identifier.cristin1886446
dc.description.localcodeAll article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).en_US
dc.source.articlenumber021105en_US
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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