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dc.contributor.authorMeyer, Hans Kristian Hygen
dc.contributor.authorMarskar, Robert
dc.contributor.authorGjemdal, Henrik
dc.contributor.authorMauseth, Frank
dc.description.abstractWe investigate the propagation of positive streamers along a profiled dielectric surface in air at atmospheric pressure. Results from experiments and two-dimensional planar low-temperature plasma fluid simulations are presented and analysed. The test object consists of a disk-shaped high voltage electrode and a dielectric slab with 0.5 mm deep corrugations. The corrugated surface has a 47% larger surface area than the smooth reference surface. The experiments and simulations are performed at voltage levels that lead to either gap-bridging or arrested streamers. In both experiments and simulations, the streamers take a longer time to reach the ground electrode when propagating along the profiled surface than along the smooth reference surface. Also, arrested streamers stop closer to the high voltage electrode when a profiled surface is used. Streamers propagate closely along the surface profile in the simulations, which suggests that the observed surface profile effect is mainly a result of elongated streamer channels. Compared to the streamers propagating along the smooth surface, the elongated streamers on the profiled surface have less residual voltage at the streamer front to drive the streamer advancement. © 2020 The Author(s). Published by IOP Publishing Ltd Printed in the UKen_US
dc.publisherIOP Publishingen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.titleStreamer propagation along a profiled dielectric surfaceen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.source.journalPlasma Sources Science & Technologyen_US
dc.relation.projectNorges forskningsråd: 270033en_US
dc.description.localcodeOriginal content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.en_US

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Navngivelse 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Navngivelse 4.0 Internasjonal