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dc.contributor.authorSchaab, Jakob
dc.contributor.authorShapovalov, Konstantin
dc.contributor.authorSchoenherr, Peggy
dc.contributor.authorHackl, Johanna
dc.contributor.authorKhan, Muhammad Imtiaz
dc.contributor.authorHentschel, Mario
dc.contributor.authorYan, Zewu
dc.contributor.authorBourret, Edith
dc.contributor.authorSchneider, Claus M.
dc.contributor.authorNemsak, Slavomír
dc.contributor.authorStengel, Massimiliano
dc.contributor.authorCano, Andrés
dc.contributor.authorMeier, Dennis
dc.date.accessioned2020-01-14T08:15:43Z
dc.date.available2020-01-14T08:15:43Z
dc.date.created2020-01-07T13:48:31Z
dc.date.issued2019
dc.identifier.citationApplied Physics Letters. 2019, 115 (12), 122903-1-122803-5.nb_NO
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/11250/2636060
dc.description.abstractLow-temperature X-ray photoemission electron microscopy (X-PEEM) is used to measure the electric potential at domain walls in improper ferroelectric Er0.99Ca0.01MnO3. By combining X-PEEM with scanning probe microscopy and theory, we develop a model that relates the detected X-PEEM contrast to the emergence of uncompensated bound charges, explaining the image formation based on intrinsic electronic domain-wall properties. In contrast to previously applied low-temperature electrostatic force microscopy (EFM), X-PEEM readily distinguishes between positive and negative bound charges at domain walls. Our study introduces an X-PEEM-based approach for low-temperature electrostatic potential mapping, facilitating nanoscale spatial resolution and data acquisition times on the order of 0.1–1 s.nb_NO
dc.language.isoengnb_NO
dc.publisherAIP Publishingnb_NO
dc.titleElectrostatic potential mapping at ferroelectric domain walls by low-temperature photoemission electron microscopynb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.pagenumber122903-1-122803-5nb_NO
dc.source.volume115nb_NO
dc.source.journalApplied Physics Lettersnb_NO
dc.source.issue12nb_NO
dc.identifier.doi10.1063/1.5117881
dc.identifier.cristin1767747
dc.description.localcodeThis is the authors’ accepted and refereed manuscript to the article. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared may be found at http://dx.doi.org/10.1063/1.5117881nb_NO
cristin.unitcode194,66,35,0
cristin.unitnameInstitutt for materialteknologi
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode2


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