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Parametric model of the Mueller matrix of a Spectralon white reflectance standard deduced by polar decomposition techniques

Kildemo, Morten; Jerome, Maria; Ellingsen, Pål Gunnar; Aas, Lars Martin Sandvik
Journal article, Peer reviewed
Published version
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URI
http://hdl.handle.net/11250/2624808
Date
2013
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  • Publikasjoner fra CRIStin - NTNU [34889]
Original version
Optics Express. 2013, 21 (15), 18509-18524.   10.1364/OE.21.018509
Abstract
Decomposition methods have been applied to in-plane Mueller matrix ellipsometric scattering data of the Spectralon reflectance standard. Data were measured at the wavelengths 532 nm and 1500 nm, using an achromatic optimal Mueller matrix scatterometer applying a photomultiplier tube and a high gain InGaAs detector for the two wavelengths. A parametric model with physical significance was deduced through analysis of the product decomposed matrices. It is found that when the data are analyzed as a function of the scattering angle, similar to particle scattering, the matrix elements are largely independent of incidence angle. To the first order, we propose that a Guassian lineshape is appropriate to describe the polarization index, while the decomposed diagonal elements of the retardance matrix have a form resembling Rayleigh single scattering. New models are proposed for the off diagonal elements of the measured Mueller matrix.
Publisher
Optical Society of America
Journal
Optics Express

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