Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development

dc.contributor.advisor	Dahl, Paul Inge	nb_NO
dc.contributor.author	Krogstad, Hedda Nordby	nb_NO
dc.date.accessioned	2014-12-19T13:26:36Z
dc.date.available	2014-12-19T13:26:36Z
dc.date.created	2012-11-08	nb_NO
dc.date.issued	2012	nb_NO
dc.identifier	566402	nb_NO
dc.identifier	ntnudaim:8218	nb_NO
dc.identifier.uri	http://hdl.handle.net/11250/249102
dc.description.abstract	Optimalization of PLD deposition of YSZ for micr-SOFC electrolyte applications by varying deposition pressure and target-substrate distance.Substrate used was Si-based chips and wafers (large area PLD), and the substrate temperature was held at 600. Dense films were obtained at 20 mTorr.	nb_NO
dc.language	eng	nb_NO
dc.publisher	Institutt for materialteknologi	nb_NO
dc.subject	ntnudaim:8218	no_NO
dc.subject	MTMT Materialteknologi	no_NO
dc.subject	Materialer og energiteknologi	no_NO
dc.title	Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development	nb_NO
dc.type	Master thesis	nb_NO
dc.source.pagenumber	52	nb_NO
dc.contributor.department	Norges teknisk-naturvitenskapelige universitet, Fakultet for naturvitenskap og teknologi, Institutt for materialteknologi	nb_NO