| dc.contributor.author | Kok, Angela | |
| dc.contributor.author | Hansen, Thor-Erik | |
| dc.contributor.author | Hansen, Trond Andreas | |
| dc.contributor.author | Jensen, Geir Uri | |
| dc.contributor.author | Lietaer, Nicolas | |
| dc.contributor.author | Mielnik, Michal Marek | |
| dc.contributor.author | Storås, Preben | |
| dc.date.accessioned | 2017-07-10T10:48:13Z | |
| dc.date.available | 2017-07-10T10:48:13Z | |
| dc.date.created | 2012-11-23T15:18:31Z | |
| dc.date.issued | 2009 | |
| dc.identifier.citation | IEEE Nuclear Science Symposium Conference Record. 2009, 1623-1627. | nb_NO |
| dc.identifier.issn | 1082-3654 | |
| dc.identifier.uri | http://hdl.handle.net/11250/2448306 | |
| dc.description.abstract | 3D detectors with electrodes penetrating through the entire silicon substrate have many advantages over conventional planar silicon technology, for example, high radiation tolerance. High aspect ratio through-wafer holes are essential in such fabrication, and deep reactive ion etching (DRIE) is used. A series of DRIE processes were tested and optimised to achieve the required aspect ratio, and in 5-μm wide trenches, aspect ratios of 58:1 were achieved | nb_NO |
| dc.language.iso | eng | nb_NO |
| dc.publisher | IEEE | nb_NO |
| dc.subject | Raidation tolerance | nb_NO |
| dc.subject | Deep reactive ion etching | nb_NO |
| dc.subject | High aspect ratio | nb_NO |
| dc.subject | 3D detectors | nb_NO |
| dc.title | High aspect ratio deep RIE for novel 3D radiation sensors in high energy physics applications | nb_NO |
| dc.type | Journal article | nb_NO |
| dc.type | Peer reviewed | nb_NO |
| dc.description.version | acceptedVersion | |
| dc.source.pagenumber | 1623-1627 | nb_NO |
| dc.source.journal | IEEE Nuclear Science Symposium Conference Record | nb_NO |
| dc.identifier.doi | 10.1109/NSSMIC.2009.5402256 | |
| dc.identifier.cristin | 964556 | |
| dc.description.localcode | © 2009 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works | nb_NO |
| cristin.unitcode | 194,64,25,0 | |
| cristin.unitname | Institutt for energi- og prosessteknikk | |
| cristin.ispublished | true | |
| cristin.fulltext | postprint | |
| cristin.qualitycode | 1 | |
