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dc.contributor.authorLu, Haidong
dc.contributor.authorTan, Yueze
dc.contributor.authorRicharz, Leonie
dc.contributor.authorHe, Jiali
dc.contributor.authorWang, Bo
dc.contributor.authorMeier, Dennis
dc.contributor.authorChen, Long-Qing
dc.contributor.authorGruverman, Alexei
dc.date.accessioned2024-02-13T12:02:59Z
dc.date.available2024-02-13T12:02:59Z
dc.date.created2023-02-18T18:20:15Z
dc.date.issued2023
dc.identifier.issn1616-301X
dc.identifier.urihttps://hdl.handle.net/11250/3117267
dc.description.abstractPiezoresponse force microscopy (PFM) is used for investigation of the electromechanical behavior of the head-to-head (H-H) and tail-to-tail (T-T) domain walls on the non-polar surfaces of three uniaxial ferroelectric materials with different crystal structures: LiNbO3, Pb5Ge3O11, and ErMnO3. It is shown that, contrary to the common expectation that the domain walls should not exhibit any PFM response on the non-polar surface, an out-of-plane deformation of the crystal at the H-H and T-T domain walls occurs even in the absence of the out-of-plane polarization component due to a specific form of the piezoelectric tensor. In spite of their different symmetry, in all studied materials, the dominant contribution comes from the counteracting shear strains on both sides of the H-H and T-T domain walls. The finite element analysis approach that takes into account a contribution of all elements in the piezoelectric tensor, is applicable to any ferroelectric material and can be instrumental for getting a new insight into the coupling between the electromechanical and electronic properties of the charged ferroelectric domain walls.en_US
dc.language.isoengen_US
dc.publisherWiley-VCH GmbHen_US
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/deed.no*
dc.titleElectromechanics of Domain Walls in Uniaxial Ferroelectricsen_US
dc.title.alternativeElectromechanics of Domain Walls in Uniaxial Ferroelectricsen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.source.pagenumber0en_US
dc.source.volume33en_US
dc.source.journalAdvanced Functional Materialsen_US
dc.source.issue15en_US
dc.identifier.doi10.1002/adfm.202213684
dc.identifier.cristin2127216
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode2


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Attribution-NonCommercial-NoDerivatives 4.0 Internasjonal
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