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dc.contributor.authorPadamata, Sai Krishna
dc.contributor.authorYasinskiy, Andrey
dc.contributor.authorYanov, Valentin
dc.contributor.authorSævarsdottir, Gudrun
dc.date.accessioned2023-02-16T17:25:36Z
dc.date.available2023-02-16T17:25:36Z
dc.date.created2022-04-27T12:33:45Z
dc.date.issued2022
dc.identifier.citationMetals. 2022, 12 (2), .en_US
dc.identifier.issn2075-4701
dc.identifier.urihttps://hdl.handle.net/11250/3051725
dc.description.abstractSurface coatings can enhance the substrate material’s properties and increase its lifetime. HEA-based materials have been extensively investigated as coating materials due to their superior hardness, excellent oxidation and corrosion resistance, effective diffusion barrier properties and wear resistance. Magnetron sputtering has been regarded as one of the most efficient methods for the deposition of HEA-based thin films. Metallic- and nitride-based HEA coatings can be easily deposited by introducing N2 gas along with the Ar in the reaction chamber. The parameters such as target composition, bias voltage, sputtering power and notably, gas flow ratio, influence the thin film’s morphology and mechanical properties.en_US
dc.language.isoengen_US
dc.publisherMDPIen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleMagnetron Sputtering High-Entropy Alloy Coatings: A Mini-Reviewen_US
dc.title.alternativeMagnetron Sputtering High-Entropy Alloy Coatings: A Mini-Reviewen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.source.pagenumber0en_US
dc.source.volume12en_US
dc.source.journalMetalsen_US
dc.source.issue2en_US
dc.identifier.doi10.3390/met12020319
dc.identifier.cristin2019469
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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