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dc.contributor.authorMondragón-Ochoa, Jesús S.
dc.contributor.authorGonzález-Rivera, José
dc.contributor.authorToparli, Cigdem
dc.contributor.authorKhanum, Rizwana
dc.contributor.authorMoirangthem, Rakesh S.
dc.contributor.authorDuce, Celia
dc.contributor.authorFerrari, Carlo
dc.contributor.authorBarillaro, Giuseppe
dc.contributor.authorErbe, Andreas
dc.description.abstractOptical whispering gallery mode microresonators (WGM-µRs) are powerful sensitive components with many analytical applications. Here, spherical WGM-µRs have been synthesised in a single-step microwave (MW)-assisted heterophase polymerisation. The microresonators are based on poly(styrene) beads into which the organic lasing dye nile red was incorporated as gain medium in situ during the polymerisation. The particle diameter and diameter distribution of the synthesised particles were tuned in the range of around 200 nm up to 50 µm by adjusting the concentration between stabiliser poly-(N-vinyl pyrrolidone) (PVP) and monomer styrene, and the solvent composition in the dispersion process. Lower water content enabled the synthesis of spherical particles with large size polydispersity, from which WGM-µRs with a variety of diameters were selected. Microspheres with diameters ${\gtrsim}3.5~\mu$m supported WGMs. The WGMs were excited through free space via the fluorescence of the laser dye. Pumping power levels ${\lt}$1 µW were sufficient to excite WGMs. WGM shifts of beads with diameter between ≈5 and 30 µm measured in air and water show a sensitivity up to 54 nm/RIU for the smallest particles. Dye doped WGM-µR in the low µm size range obtained by the MW-assisted polymerisation process with its versatility, low processing times and high yields opens new horizons for the applications of these systems as sensors.en_US
dc.publisherIOP Publishingen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.titleMicrowave-assisted in situ laser dye incorporation into high sensitivity whispering gallery mode microresonatorsen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.source.journalJournal of Physics D: Applied Physicsen_US

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Navngivelse 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Navngivelse 4.0 Internasjonal