Vis enkel innførsel

dc.contributor.authorPuntigam, Lukas
dc.contributor.authorSchultheiss, Jan
dc.contributor.authorStrinic, Ana
dc.contributor.authorYan, Zewu
dc.contributor.authorBourret, Edith
dc.contributor.authorAltthaler, Markus
dc.contributor.authorKeszmarki, Istvan
dc.contributor.authorEvans, Donald
dc.contributor.authorMeier, Dennis Gerhard
dc.contributor.authorKrohns, Stephan
dc.date.accessioned2021-03-01T08:53:03Z
dc.date.available2021-03-01T08:53:03Z
dc.date.created2021-02-26T08:11:40Z
dc.date.issued2021
dc.identifier.citationJournal of Applied Physics. 2021, 129, .en_US
dc.identifier.issn0021-8979
dc.identifier.urihttps://hdl.handle.net/11250/2730802
dc.description.abstractWe report the dielectric properties of improper ferroelectric hexagonal (h-)ErMnO3. From the bulk characterization, we observe a temperature and frequency range with two distinct relaxation-like features, leading to high and even “colossal” values for the dielectric permittivity. One feature trivially originates from the formation of a Schottky barrier at the electrode–sample interface, whereas the second one relates to an internal barrier layer capacitance (BLC). The calculated volume fraction of the internal BLC (of 8%) is in good agreement with the observed volume fraction of insulating domain walls (DWs). While it is established that insulating DWs can give rise to high dielectric constants, studies typically focused on proper ferroelectrics where electric fields can remove the DWs. In h-ErMnO3, by contrast, the insulating DWs are topologically protected, facilitating operation under substantially higher electric fields. Our findings provide the basis for a conceptually new approach to engineer materials exhibiting colossal dielectric permittivities using domain walls in improper ferroelectrics.en_US
dc.language.isoengen_US
dc.publisherAIP Publishing, American Institute of Physicsen_US
dc.titleInsulating improper ferroelectric domain walls as robust barrier layer capacitorsen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionacceptedVersionen_US
dc.source.volume129en_US
dc.source.journalJournal of Applied Physicsen_US
dc.identifier.doi10.1063/5.0038300
dc.identifier.cristin1893883
dc.description.localcodeThis is the authors’ accepted and refereed manuscript to the article. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Journal of Applied Physics 129, 074101 (2021) and may be found at https://doi.org/10.1063/5.0038300.en_US
dc.source.articlenumber074101en_US
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


Tilhørende fil(er)

Thumbnail

Denne innførselen finnes i følgende samling(er)

Vis enkel innførsel