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dc.contributor.authorModanese, Chiara
dc.contributor.authorArnberg, Lars
dc.contributor.authorDi Sabatino, Marisa
dc.date.accessioned2020-03-25T13:54:37Z
dc.date.available2020-03-25T13:54:37Z
dc.date.created2016-01-22T13:41:38Z
dc.date.issued2015
dc.identifier.citationMethodsX. 2015, 2 409-414.en_US
dc.identifier.issn2215-0161
dc.identifier.urihttps://hdl.handle.net/11250/2648627
dc.description.abstractGlow discharge mass spectrometry (GDMS) is widely used for trace element analysis of bulk solid samples. Thegeometry of the GD source limits the minimum size of the sample, which for the instrument used in this work(ThermoElementGD) is 20mm in diameter. From time to time, there is the need to analyse smaller samples withthis technique, and we present here a methodology to analyse samples of 9–20mm diameter through the use ofthin masks.Thin masks have been previously used mostly as secondary cathode for the analysis of non-conducting materials,with hole size smaller than the area of the glow discharge. The use of masks in this work includes the followingcustomization: The choice of highly-pure Si as mask material, to decrease the chance of interferences with the Si samples. The use of a hole in the mask of the same size as the discharge area. This implies that the mask material is notsputtered, thus decreasing chances for contamination from the mask itselfen_US
dc.language.isoengen_US
dc.publisherElsevieren_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleMethodology to analyse small silicon samples by glow discharge mass spectroscopy using thin wafer masken_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.source.pagenumber409-414en_US
dc.source.volume2en_US
dc.source.journalMethodsXen_US
dc.identifier.doi10.1016/j.mex.2015.10.005
dc.identifier.cristin1320337
dc.description.localcode© 2015 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).en_US
cristin.unitcode194,66,35,0
cristin.unitnameInstitutt for materialteknologi
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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