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dc.contributor.authorHoseinpur Kermani, Arman
dc.contributor.authorTang, Kai
dc.contributor.authorSafarian, Jafar
dc.date.accessioned2019-11-18T10:51:56Z
dc.date.available2019-11-18T10:51:56Z
dc.date.created2019-11-15T18:08:28Z
dc.date.issued2019
dc.identifier.citationSeparation and Purification Technology. 2019, 235 .nb_NO
dc.identifier.issn1383-5866
dc.identifier.urihttp://hdl.handle.net/11250/2628969
dc.description.abstractThis research is devoted to study phosphorus removal from Si-Al alloys by vacuum refining of the ternary system of dilute solutions of P in Si-20 wt%Al. The experiments were carried out in an induction furnace and after the refining process, the melt was characterized by ICP-MS technique to trace the concentration change of the volatile elements. The experimental results show that P removal from Si-Al-P melts takes place faster compared to Si-P melts and Al evaporates during the vacuum refining as well. The empirical kinetics of P and Al evaporation is discussed and the apparent activation energy for P and Al evaporation from Si-Al melts is obtained as EP = 249.4 kJ·mol 1and EAl = 144.8 kJ·mol 1 respectively. Results show that the composition of the melt changes continuously during the refining process due to rapid Al evaporation. In order to investigate the evaporation kinetics of the melt constituents, we developed a numerical approach by applying the Hertz-KnudsenLangmuir equation for evaporation. This approach can be applied to model the evaporation of the melt constituents in a ternary system whose composition changes during the vacuum refining process. The model is validated with performed experimental results and it can be applied to discuss the effect of temperature, pressure, initial melt composition on the time of vacuum refining.nb_NO
dc.language.isoengnb_NO
dc.publisherElseviernb_NO
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/deed.no*
dc.titleKinetic study of vacuum evaporation of elements from ternary melts; case of dilute solution of P in Si-Al meltsnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionpublishedVersionnb_NO
dc.source.pagenumber15nb_NO
dc.source.volume235nb_NO
dc.source.journalSeparation and Purification Technologynb_NO
dc.identifier.doi10.1016/j.seppur.2019.116284
dc.identifier.cristin1748212
dc.description.localcode© 2019 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/BY-NC-ND/4.0/).nb_NO
cristin.unitcode194,66,35,0
cristin.unitnameInstitutt for materialteknologi
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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Attribution-NonCommercial-NoDerivatives 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 Internasjonal