Vis enkel innførsel

dc.contributor.authorZhu, Zhen
dc.contributor.authorModanese, Chiara
dc.contributor.authorSippola, Perttu
dc.contributor.authorDi Sabatino Lundberg, Marisa
dc.contributor.authorSavin, Hele
dc.date.accessioned2019-08-22T08:01:01Z
dc.date.available2019-08-22T08:01:01Z
dc.date.created2019-01-23T11:24:23Z
dc.date.issued2018
dc.identifier.citationPhysica Status Solidi (a) applications and materials science. 2018, 215 (6), .nb_NO
dc.identifier.issn1862-6300
dc.identifier.urihttp://hdl.handle.net/11250/2609750
dc.description.abstractIn this contribution, pulsed radio frequency (rf) glow discharge optical emission spectroscopy (GDOES) is used to investigate the film properties of SiO2 deposited by plasma enhanced atomic layer deposition (PEALD), for example, the chemical composition, structural properties and film thickness. The total sputtering time until the interface between the SiO2 layer and the Si substrate is ≈13 s. The main impurities in the film, that is, H, C, and N, are detected. It is observed that both C and N intensities decrease with increasing plasma power during deposition of the thin film. The higher plasma power seems to increase the reactivity of the PEALD process and consequently, it might reduce the concentration of impurities in the deposited film. Moreover, the deviation of the GDOES sputtering rates on the film are related to the film density. The thickness of one‐hundred‐nanometer range SiO2 film is calculated from the GDOES silicon and oxygen emission profiles, and its difference from ellipsometry and X‐ray reflectivity measurements highlights the challenges for the GDOES technique for transparent thin films.nb_NO
dc.language.isoengnb_NO
dc.publisherWileynb_NO
dc.titleNanometer‐Scale Depth‐Resolved Atomic Layer Deposited SiO2 Thin Films Analyzed by Glow Discharge Optical Emission Spectroscopynb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.pagenumber5nb_NO
dc.source.volume215nb_NO
dc.source.journalPhysica Status Solidi (a) applications and materials sciencenb_NO
dc.source.issue6nb_NO
dc.identifier.doi10.1002/pssa.201700864
dc.identifier.cristin1663568
dc.description.localcodeThis is the peer reviewed version of an article, which has been published in final form at [https://doi.org/10.1002/pssa.201700864]. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving.nb_NO
cristin.unitcode194,66,35,0
cristin.unitnameInstitutt for materialteknologi
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode1


Tilhørende fil(er)

Thumbnail

Denne innførselen finnes i følgende samling(er)

Vis enkel innførsel