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dc.contributor.authorKrzysztof, Adamczyk
dc.contributor.authorSøndenå, Rune
dc.contributor.authorStokkan, Gaute
dc.contributor.authorLooney, Erin
dc.contributor.authorJensen, Mallory
dc.contributor.authorLai, Barry
dc.contributor.authorRinio, Markus
dc.contributor.authorSabatino, Marisa Di
dc.date.accessioned2018-03-09T13:13:36Z
dc.date.available2018-03-09T13:13:36Z
dc.date.created2018-02-28T09:34:08Z
dc.date.issued2018
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/11250/2489847
dc.description.abstractIn this work, we applied internal quantum efficiency mapping to study the recombination activity of grain boundaries in High Performance Multicrystalline Silicon under different processing conditions. Wafers were divided into groups and underwent different thermal processing, consisting of phosphorus diffusion gettering and surface passivation with hydrogen rich layers. After these thermal treatments, wafers were processed into heterojunction with intrinsic thin layer solar cells. Light Beam Induced Current and Electron Backscatter Diffraction were applied to analyse the influence of thermal treatment during standard solar cell processing on different types of grain boundaries. The results show that after cell processing, most random-angle grain boundaries in the material are well passivated, but small-angle grain boundaries are not well passivated. Special cases of coincidence site lattice grain boundaries with high recombination activity are also found. Based on micro-X-ray fluorescence measurements, a change in the contamination level is suggested as the reason behind their increased activity.nb_NO
dc.language.isoengnb_NO
dc.publisherAIP Publishingnb_NO
dc.titleRecombination activity of grain boundaries in high-performance multicrystalline Si during solar cell processingnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionpublishedVersionnb_NO
dc.source.volume123nb_NO
dc.source.journalJournal of Applied Physicsnb_NO
dc.source.issue5nb_NO
dc.identifier.doihttps://doi.org/10.1063/1.5018797
dc.identifier.cristin1569319
dc.relation.projectNorges forskningsråd: 228930nb_NO
dc.description.localcodePublished by AIP Publishing. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. Locked until 1.1.2019 due to copyright restrictions. The following article appeared in Journal of Applied Physics and may be found at https://aip.scitation.org/doi/full/10.1063/1.5018797nb_NO
cristin.unitcode194,0,0,0
cristin.unitnameNorges teknisk-naturvitenskapelige universitet
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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