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dc.contributor.authorToparli, Cigdem
dc.contributor.authorSarfraz, Adnan
dc.contributor.authorWieck, Andreas D.
dc.contributor.authorRohwerder, Michael
dc.contributor.authorErbe, Andreas
dc.identifier.citationElectrochimica Acta. 2017, 236 104-115.nb_NO
dc.description.abstractFormation and dissolution of oxide on copper under transpassive conditions, i.e. during OER and transpassive dissolution, in alkaline electrolyte was investigated by a combination of electrochemical techniques and in situ and operando Raman and photoluminescence (PL) spectroscopy, as well as spectropscopic ellipsometry. Experiments were conducted under potentiodynamic and potentiostatic polarisation in 0.1M NaOH. In chronoamperometry experiments with steps between potentials, oxide thickness continued increasing beyond the onset of OER. The thickness dropped significantly from >10 nm to <5 nm ≈400 mV above the OER onset. The presence of CuO, Cu2O and Cu4O3 was observed by Raman spectroscopy after the onset of OER. Correlating with the thickness drop, strong PL was observed at 1.55 eV, indicating the formation of singly charged oxygen vacancies VView the MathML source, following the classical PL spectrum interpretation from the literature. PL observation speaks against vacancy pair coalescence as mechanism of dissolution. After electrochemical experiments, the films were n-type semiconductors, not p-type conductors as expected for copper oxides. Results indicate that transpassive dissolution may be triggered by the instability of the oxide with respect to defect formation.nb_NO
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internasjonal*
dc.titleIn situ and operando observation of surface oxides during oxygen evolution reaction on coppernb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.source.journalElectrochimica Actanb_NO
dc.description.localcode© 2017 Elsevier Ltd. All rights reserved. This is the authors' accepted and refereed manuscript to the article. Locked until May 31 2019 due to copyright restrictionsnb_NO
cristin.unitnameInstitutt for materialteknologi

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Attribution-NonCommercial-NoDerivatives 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 Internasjonal