Browsing Institutt for materialteknologi by Journals "MethodsX"
Now showing items 1-3 of 3
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Guidelines for establishing an etching procedure for dislocation density measurements on multicrystalline silicon samples
(Journal article; Peer reviewed, 2018)With multicrystalline silicon becoming the main material used for photovoltaic applications and dislocations being one of the main material limitations to better solar cell efficiency, etch pit density measurements are ... -
Methodology to analyse small silicon samples by glow discharge mass spectroscopy using thin wafer mask
(Peer reviewed; Journal article, 2015)Glow discharge mass spectrometry (GDMS) is widely used for trace element analysis of bulk solid samples. Thegeometry of the GD source limits the minimum size of the sample, which for the instrument used in this ... -
Novel combinatory method for surface and crystallinity analysis of crystalline materials
(Journal article; Peer reviewed, 2023)