Blar i NTNU Open på forfatter "Savin, Hele"
-
Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions
Matkivskyi, Vladyslav; Leiviska, Oskari; Wenner, Sigurd; Liu, Hanchen; Vahanissi, Ville; Savin, Hele; Sabatino, Marisa Di; Tranell, Maria Gabriella (Journal article, 2023)Two widely used atomic layer deposition precursors, Tetrakis (dimethylamido) titanium (TDMA-Ti) and titanium tetrachloride (TiCl4), were investigated for use in the deposition of TiOx-based thin films as a passivating ... -
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
Zhu, Zhen; Sippola, Perttu; Ylivaara, Oili M E; Modanese, Chiara; Di Sabatino Lundberg, Marisa; Mizohata, Kenichiro; Merdes, Saoussen; Lipsanen, Harri; Savin, Hele (Peer reviewed; Journal article, 2019)In this work, we report the successful growth of high-quality SiO2 films by low-temperature plasma-enhanced atomic layer deposition using an oxidant which is compatible with moisture/oxygen sensitive materials. The SiO2 ... -
Nanometer‐Scale Depth‐Resolved Atomic Layer Deposited SiO2 Thin Films Analyzed by Glow Discharge Optical Emission Spectroscopy
Zhu, Zhen; Modanese, Chiara; Sippola, Perttu; Di Sabatino Lundberg, Marisa; Savin, Hele (Journal article; Peer reviewed, 2018)In this contribution, pulsed radio frequency (rf) glow discharge optical emission spectroscopy (GDOES) is used to investigate the film properties of SiO2 deposited by plasma enhanced atomic layer deposition (PEALD), for ... -
Surface passivation properties of HfO2 thin film on n-Type crystalline Si
Cheng, Xuemei; Repo, Paivikki; Haug, Halvard; Perros, Alexander Pyymaki; Marstein, Erik Stensrud; Di Sabatino Lundberg, Marisa; Savin, Hele (Journal article, 2017)Atomic layer deposited hafnium oxide is shown to provide good surface passivation of low resistivity, n-type crystalline Si wafers after a low temperature anneal. The surface passivation is related to a fixed negative ...