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dc.contributor.advisorTranell, Gabriellanb_NO
dc.contributor.authorZhang, Xinhaonb_NO
dc.date.accessioned2014-12-19T13:27:36Z
dc.date.available2014-12-19T13:27:36Z
dc.date.created2013-09-19nb_NO
dc.date.issued2013nb_NO
dc.identifier649833nb_NO
dc.identifierntnudaim:9915nb_NO
dc.identifier.urihttp://hdl.handle.net/11250/249369
dc.description.abstractThe results of this study show the main findings in this work. The points are summarized as follow:1.With the temperature increased, many cracks formed inside the quartz. When the temperature was approaching melting point, quartz became glassy first, and then melted when temperature reached melting point.2.Silicon metal was produced during the heating and holding time. The amount of silicon metal produced increased with the temperature increasing. However, the effect of temperature is still necessary to prove.3.Impurities diffused with the temperature increasing. Above 1700 degrees;, the impurities diffused to the side of samples; above 1900 degrees;, most of impurities precipitated on the edge of samples.4.No regular pattern between the concentration and temperature was found in this study.nb_NO
dc.languageengnb_NO
dc.publisherInstitutt for materialteknologinb_NO
dc.titleQuartz Behavior in Si Productionnb_NO
dc.typeMaster thesisnb_NO
dc.source.pagenumber176nb_NO
dc.contributor.departmentNorges teknisk-naturvitenskapelige universitet, Fakultet for naturvitenskap og teknologi, Institutt for materialteknologinb_NO


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