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dc.contributor.authorVinje, Jakob
dc.contributor.authorBeckwith, Kai Sandvold
dc.contributor.authorSikorski, Pawel
dc.date.accessioned2020-02-07T06:59:09Z
dc.date.available2020-02-07T06:59:09Z
dc.date.created2020-02-06T08:55:52Z
dc.date.issued2020
dc.identifier.citationJournal of microelectromechanical systemsnb_NO
dc.identifier.issn1057-7157
dc.identifier.urihttp://hdl.handle.net/11250/2640127
dc.description.abstractFlat surfaces decorated with micro- and nanostructures are important tools in biomedical research used to control cellular shape, in studies of mechanotransduction, membrane mechanics, cell migration and cellular interactions with nanostructured surfaces. Existing methods to fabricate surface-bound nanostructures are typically limited either by resolution, aspect ratio or throughput. In this work, we explore electron beam lithography based structuring of the epoxy resist SU-8 on glass substrate. We focus on a systematic investigation of the process parameters and determine limits of the fabrication process, both in terms of spatial resolution, structure aspect ratio and fabrication throughput. The described approach is capable of producing high-aspect ratio, surface bound nanostructures with height ranging from 100 nm to 4000 nm and with in-plane resolution below 100 nm directly on a transparent substrate. Fabricated nanostructured surfaces can be integrated with common techniques for biomedical research, such as high numerical aperture optical microscopy. Furthermore, we show how the described approach can be used to make nanostructures with multiple heights on the same surface, something which is not readily achievable using alternative fabrication approaches. Our research paves an alternative way of manufacturing nanostructured surfaces with applications in life science research. [2019-0255]nb_NO
dc.language.isoengnb_NO
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)nb_NO
dc.titleElectron Beam Lithography Fabrication of SU-8 Polymer Structures for Cell Studiesnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.journalJournal of microelectromechanical systemsnb_NO
dc.identifier.doi10.1109/JMEMS.2020.2967174
dc.identifier.cristin1791467
dc.description.localcode© 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.nb_NO
cristin.unitcode194,66,20,0
cristin.unitcode194,65,15,0
cristin.unitnameInstitutt for fysikk
cristin.unitnameInstitutt for klinisk og molekylær medisin
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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