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dc.contributor.authorRamezani, Mohammad
dc.contributor.authorShayegani Akmal, Amir Abbas
dc.contributor.authorNiayesh, Kaveh
dc.date.accessioned2020-01-15T09:52:38Z
dc.date.available2020-01-15T09:52:38Z
dc.date.created2019-03-26T12:01:33Z
dc.date.issued2019
dc.identifier.citationIEEE Transactions on Plasma Science. 2019, 47 (3), 1629-1636.nb_NO
dc.identifier.issn0093-3813
dc.identifier.urihttp://hdl.handle.net/11250/2636363
dc.description.abstractLow-temperature plasma ion mobility spectrometry (LTP-IMS) is the method to identify some materials by measuring concentration of gas phase ions. IMS used in a wide range of laboratory-based biomedical research studies. A nanosecond pulse generator is necessary for LTP-IMS apparatus to enable direct analysis of various chemical compounds without having to evaporate the analyte or seek a solvent or any reagent. In this paper, a dual Marx pulsed generator for LTP-IMS Ionization power supply is proposed based on a new combination of some solid-state switches including insulated gate bipolar transistor (IGBT) and avalanche bipolar junction transistors (BJTs). The compact dual Marx generator is composed of a series of avalanche BJTs and an IGBT as the trigger switch, where its rise time is reduced from 100 to 5 ns by using an avalanche BJT in its command circuit. In this way, a controllable high-voltage pulse generator has designed, built, and tested. The proposed circuit can be used to generate the repetitive high-voltage pulses necessary for low temperature ionization in advanced IMS apparatus. The output voltage has an amplitude of up to 6 kV with pulse widths in the range of 40-1000 ns and pulse repetition rates up to 2 kHz, having rise time and fall time less than 10 ns independent of the load specifications.nb_NO
dc.language.isoengnb_NO
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)nb_NO
dc.titleSolid-State High-Voltage Pulse Generator for Low Temperature Plasma Ion Mobility Spectrometrynb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionacceptedVersionnb_NO
dc.source.pagenumber1629-1636nb_NO
dc.source.volume47nb_NO
dc.source.journalIEEE Transactions on Plasma Sciencenb_NO
dc.source.issue3nb_NO
dc.identifier.doi10.1109/TPS.2019.2894844
dc.identifier.cristin1687788
dc.description.localcode© 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.nb_NO
cristin.unitcode194,63,20,0
cristin.unitnameInstitutt for elkraftteknikk
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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