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dc.contributor.authorVerhagen, Tim
dc.contributor.authorPacáková, Barbara
dc.contributor.authorKalbac, Martin
dc.contributor.authorVejpravova, Jana
dc.date.accessioned2019-09-25T14:08:06Z
dc.date.available2019-09-25T14:08:06Z
dc.date.created2019-04-28T22:30:13Z
dc.date.issued2019
dc.identifier.citationNanomaterials. 2019, 9 (3), 1-8.nb_NO
dc.identifier.issn2079-4991
dc.identifier.urihttp://hdl.handle.net/11250/2618805
dc.description.abstractThe control of graphene’s topography at the nanoscale level opens up the possibility to greatly improve the surface functionalization, change the doping level or create nanoscale reservoirs. However, the ability to control the modification of the topography of graphene on a wafer scale is still rather challenging. Here we present an approach to create well-defined nanowrinkles on a wafer scale using nitrocellulose as the polymer to transfer chemical vapor deposition grown graphene from the copper foil to a substrate. During the transfer process, the complex tertiary nitrocellulose structure is imprinted into the graphene area layer. When the graphene layer is put onto a substrate this will result in a well-defined nanowrinkle pattern, which can be subsequently further processed. Using atomic force and Raman microscopy, we characterized the generated nanowrinkles in graphene.nb_NO
dc.language.isoengnb_NO
dc.publisherMDPInb_NO
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleIntroducing Well-Defined Nanowrinkles in CVD Grown Graphenenb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionpublishedVersionnb_NO
dc.source.pagenumber1-8nb_NO
dc.source.volume9nb_NO
dc.source.journalNanomaterialsnb_NO
dc.source.issue3nb_NO
dc.identifier.doi10.3390/nano9030353
dc.identifier.cristin1694409
dc.description.localcode© 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).nb_NO
cristin.unitcode194,66,20,0
cristin.unitnameInstitutt for fysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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Navngivelse 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Navngivelse 4.0 Internasjonal