dc.contributor.author | Provine, J | |
dc.contributor.author | Schindler, Peter | |
dc.contributor.author | Torgersen, Jan | |
dc.contributor.author | Hyo Jin, Kim | |
dc.contributor.author | Karnthaler, Hans-Peter | |
dc.contributor.author | Prinz, Fritz | |
dc.date.accessioned | 2017-10-25T14:07:06Z | |
dc.date.available | 2017-10-25T14:07:06Z | |
dc.date.created | 2017-03-26T16:43:32Z | |
dc.date.issued | 2016 | |
dc.identifier.citation | Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. 2016, 34 (01A138), 01A138-1-01A138-5. | nb_NO |
dc.identifier.issn | 0734-2101 | |
dc.identifier.uri | http://hdl.handle.net/11250/2462195 | |
dc.description.abstract | Tetrakisdimethylamido (TDMA) based precursors are commonly used to deposit metal oxides such as TiO2, ZrO2, and HfO2 by means of chemical vapor deposition and atomic layer deposition (ALD). Both thermal and plasma enhanced ALD (PEALD) have been demonstrated with TDMA-metal precursors. While the reactions of TDMA-type precursors with water and oxygen plasma have been studied in the past, their reactivity with pure O2 has been overlooked. This paper reports on experimental evaluation of the reaction of molecular oxygen (O2) and several metal organic precursors based on TDMA ligands. The effect of O2 exposure duration and substrate temperature on deposition and film morphology is evaluated and compared to thermal reactions with H2O and PEALD with O2 plasma. | nb_NO |
dc.language.iso | eng | nb_NO |
dc.publisher | AIP Publishing | nb_NO |
dc.relation.uri | http://avs.scitation.org/doi/10.1116/1.4937991 | |
dc.rights | Navngivelse 4.0 Internasjonal | * |
dc.rights.uri | http://creativecommons.org/licenses/by/4.0/deed.no | * |
dc.title | Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors | nb_NO |
dc.type | Journal article | nb_NO |
dc.type | Peer reviewed | nb_NO |
dc.description.version | publishedVersion | nb_NO |
dc.source.pagenumber | 01A138-1-01A138-5 | nb_NO |
dc.source.volume | 34 | nb_NO |
dc.source.journal | Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films | nb_NO |
dc.source.issue | 01A138 | nb_NO |
dc.identifier.doi | 10.1116/1.4937991 | |
dc.identifier.cristin | 1461154 | |
dc.description.localcode | This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in (Journal of Vacuum Science and Technology A) and may be found at (http://avs.scitation.org/doi/10.1116/1.4937991). Licensed under a Creative Commons Attribution 3.0 Unported License. (CC BY 3.0 NO) | nb_NO |
cristin.unitcode | 194,64,50,0 | |
cristin.unitname | Institutt for produktutvikling og materialer | |
cristin.ispublished | true | |
cristin.fulltext | original | |
cristin.qualitycode | 1 | |