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dc.contributor.advisorFjeldly, Tor Anb_NO
dc.contributor.authorHolen, Åsmundnb_NO
dc.date.accessioned2014-12-19T13:44:18Z
dc.date.accessioned2015-12-22T11:42:12Z
dc.date.available2014-12-19T13:44:18Z
dc.date.available2015-12-22T11:42:12Z
dc.date.created2010-09-04nb_NO
dc.date.issued2009nb_NO
dc.identifier348845nb_NO
dc.identifierntnudaim:4689
dc.identifier.urihttp://hdl.handle.net/11250/2369436
dc.description.abstractIn this thesis a compact drain current model for nanoscale double-gate MOSFETs is presented. The model covers all operation regimes and bias voltages up to 0.4V. The modeling is done using conformal mapping techniques to solve the 2D Laplace equation in sub-threshold, and using a long channel model in strong-inversion. In near threshold, a quasi-Fermi level model which uses empirical constants is used to find the current. A continuous model is found by expressing asymptotes in the sub-threshold and strong inversion regimes, and combining them using a interpolation function. The interpolation function uses a parameter that is decided analytically from the near threshold calculations. The model shows good agreement with numerical simulations for bias voltages below 0.4V and channel lengths bellow 50nm.nb_NO
dc.languageengnb_NO
dc.publisherInstitutt for elektronikk og telekommunikasjonnb_NO
dc.subjectntnudaimno_NO
dc.subjectSIE6 elektronikk
dc.subjectFotonikk og mikroteknologi
dc.titleCompact Modeling of the Current through Nanoscale Double-Gate MOSFETs.nb_NO
dc.typeMaster thesisnb_NO
dc.source.pagenumber54nb_NO
dc.contributor.departmentNorges teknisk-naturvitenskapelige universitet, Fakultet for informasjonsteknologi, matematikk og elektroteknikk, Institutt for elektronikk og telekommunikasjonnb_NO


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