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dc.contributor.authorRasouli, Azam
dc.contributor.authorKudyba, Artur
dc.contributor.authorBruzda, Grzegorz
dc.contributor.authorSafarian, Jafar
dc.contributor.authorTranell, Maria Gabriella
dc.date.accessioned2024-04-08T10:49:57Z
dc.date.available2024-04-08T10:49:57Z
dc.date.created2024-04-05T08:33:57Z
dc.date.issued2024
dc.identifier.issn1996-1944
dc.identifier.urihttps://hdl.handle.net/11250/3125252
dc.description.abstractHigh-temperature wetting of natural, high-purity quartz (SiO2) and liquid magnesium (Mg) was investigated at temperatures between 973 and 1273 K. Sessile drop experiments using the capillary purification (CP) procedure were carried out under an Ar gas atmosphere (N6.0), eliminating the native oxide layer on the surface of Mg melt. The results showed that the wetting behavior was strongly dependent on temperature. At 973 and 1073 K, the wetting system displayed relatively large contact angles of 90° and 65°, respectively, demonstrating modest wetting. The wetting increased to some extent by increasing the temperature to 1123 K with a wetting angle of 22°. However, the SiO2/Mg system demonstrated complete wetting at temperatures of 1173 K and above. Furthermore, interface microstructure examination showed different reaction product phases/microstructures, depending on the wetting experiment temperature.en_US
dc.language.isoengen_US
dc.publisherMDPIen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleHigh-Temperature Reactive Wetting of Natural Quartz by Liquid Magnesiumen_US
dc.title.alternativeHigh-Temperature Reactive Wetting of Natural Quartz by Liquid Magnesiumen_US
dc.typeJournal articleen_US
dc.typePeer revieweden_US
dc.description.versionpublishedVersionen_US
dc.source.volume17en_US
dc.source.journalMaterialsen_US
dc.source.issue6en_US
dc.identifier.doi10.3390/ma17061302
dc.identifier.cristin2259123
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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Navngivelse 4.0 Internasjonal
Except where otherwise noted, this item's license is described as Navngivelse 4.0 Internasjonal