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dc.contributor.authorBradford, Eric
dc.contributor.authorImsland, Lars Struen
dc.contributor.authordel Rio Chanona, Ehecatl Antonio
dc.date.accessioned2020-03-26T15:14:26Z
dc.date.available2020-03-26T15:14:26Z
dc.date.created2020-03-24T02:28:59Z
dc.date.issued2019
dc.identifier.isbn978-1-7281-1397-5
dc.identifier.urihttps://hdl.handle.net/11250/2648971
dc.description.abstractNonlinear model predictive control (NMPC) is an efficient control approach for multivariate nonlinear dynamic systems with process constraints. NMPC does however require a plant model to be available. A powerful tool to identify such a model is given by Gaussian process (GP) regression. Due to data sparsity this model may have considerable uncertainty though, which can lead to worse control performance and constraint violations. A major advantage of GPs in this context is its probabilistic nature, which allows to account for plant-model mismatch. In this paper we propose to sample possible plant models according to the GP and calculate explicit back-offs for constraint tightening using closed-loop simulations offline. These then in turn guarantee satisfaction of chance constraints online despite the uncertainty present. Important advantages of the proposed method over existing approaches include the cheap online computational time and the consideration of closed-loop behaviour to prevent open-loop growth of uncertainties. In addition we show how the method can account for updating the GP plant model using available online measurements. The proposed algorithm is illustrated on a batch reactor case study.en_US
dc.language.isoengen_US
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en_US
dc.relation.ispartofProceedings of 58th IEEE Conference on Decision and Control (CDC 2019)
dc.subjectKybernetikken_US
dc.subjectCyberneticsen_US
dc.titleNonlinear model predictive control with explicit back-offs for Gaussian process state space modelsen_US
dc.typeChapteren_US
dc.description.versionacceptedVersionen_US
dc.subject.nsiVDP::Elektrotekniske fag: 540en_US
dc.subject.nsiVDP::Electro-technical sciences: 540en_US
dc.source.pagenumber4747-4754en_US
dc.identifier.doi10.1109/CDC40024.2019.9029443
dc.identifier.cristin1803107
dc.relation.projectEC/H2020/675215en_US
dc.description.localcode© 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.en_US
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1


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