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dc.contributor.authorPham, Ky-Nam
dc.contributor.authorGaukås, Nikolai Helth
dc.contributor.authorMorozov, Maxim
dc.contributor.authorTybell, Per Thomas Martin
dc.contributor.authorVullum, Per Erik
dc.contributor.authorGrande, Tor
dc.contributor.authorEinarsrud, Mari-Ann
dc.date.accessioned2019-03-18T12:43:35Z
dc.date.available2019-03-18T12:43:35Z
dc.date.created2019-01-15T10:36:04Z
dc.date.issued2019
dc.identifier.citationRoyal Society Open Science. 2019, 6 180989-?.nb_NO
dc.identifier.issn2054-5703
dc.identifier.urihttp://hdl.handle.net/11250/2590489
dc.description.abstractWe report on an environmentally friendly and versatile aqueous chemical solution deposition route to epitaxial K0.5Na0.5NbO3 (KNN) thin films. The route is based on the spin coating of an aqueous solution of soluble precursors on SrTiO3 single crystal substrates followed by pyrolysis at 400°C and annealing at 800°C using rapid thermal processing. Strongly textured films with homogeneous thickness were obtained on three different crystallographic orientations of SrTiO3. Epitaxial films were obtained on (111) SrTiO3 substrates, while films consisting of an epitaxial layer close to the substrate followed by an oriented polycrystalline layer were obtained on (100) and (110) SrTiO3 substrates. A K2Nb4O11 secondary phase was observed on the surface of the thin films due to the evaporation of alkali species, while the use of an NaCl/KCl flux reduced the amount of the secondary phase. Ferroelectric behaviour of the films was investigated by PFM, and almost no dependence on the film crystallographic orientation was observed. The permittivity and loss tangent of the films with the NaCl/KCl flux were 870 and 0.04 (100-orientation) and 2250 and 0.025 (110-orientation), respectively, at 1 kHz.nb_NO
dc.language.isoengnb_NO
dc.publisherThe Royal Societynb_NO
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleEpitaxial K0.5Na0.5NbO3 thin films by aqueous chemical solution depositionnb_NO
dc.typeJournal articlenb_NO
dc.typePeer reviewednb_NO
dc.description.versionpublishedVersionnb_NO
dc.source.pagenumber180989-?nb_NO
dc.source.volume6nb_NO
dc.source.journalRoyal Society Open Sciencenb_NO
dc.identifier.doihttp://dx.doi.org/10.1098/rsos.180989
dc.identifier.cristin1656885
dc.relation.projectNorges forskningsråd: 197497nb_NO
dc.relation.projectNorges forskningsråd: 250184nb_NO
dc.relation.projectNorges forskningsråd: 245963nb_NO
dc.relation.projectNorges forskningsråd: 197405nb_NO
dc.description.localcode© 2019 The Authors. Published by the Royal Society under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0/, which permits unrestricted use, provided the original author and source are credited.nb_NO
cristin.unitcode194,66,35,0
cristin.unitcode194,63,35,0
cristin.unitcode194,66,20,0
cristin.unitnameInstitutt for materialteknologi
cristin.unitnameInstitutt for elektroniske systemer
cristin.unitnameInstitutt for fysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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